Governor Cuomo Announces Installation of First-of-Its-Kind Computer Chip Technology at SUNY Poly's Albany NanoTech Campus
SUNY Polytechnic and Nikon to Install World’s First 450mm Immersion Lithography Tool to Accelerate Production of Next Generation Computer Chips
Governor Andrew M. Cuomo recently announced the installation of the world’s
first ever 450mm Immersion Scanner has begun at the SUNY Polytechnic Institute's
Albany NanoTech Complex. Developed by Nikon Corporation, this first of
its kind tool will accelerate the development of the next generation computer
chips used in a variety of consumer and commercial applications.
“New York is proud to be home to some of the most sophisticated
computer chip research on the planet, and with thousands of scientists
and engineers from Albany to Buffalo we are growing the industry like
never before," Governor Cuomo said. "These strategic investments
in nanotechnology, as well as replicating the success in Albany across
Upstate, have attracted global leaders like Nikon that are bringing private
funding and job opportunities to New York."
A team including more than 50 engineers from the U.S. and around the world
will be involved in the installation. The SUNY Polytechnic-led transition
to 450mm is a technological leap for the semiconductor industry. With
applications ranging from cell phones, tablet computers, defense, green
energy, and many more, 450mm will produce more than double the number
of chips processed on today’s 300mm wafers, leading to lower costs
and far faster, more reliable computer chip technologies. The scanner
can be viewed
here.
New York is the first to establish this next generation of computer chip
technology, which is the result of Governor Cuomo’s 2011
announcement that G450C partners, including Intel, IBM, GLOBALFOUNDRIES, TSMC and Samsung,
would invest over $4.8 billion to build the world’s first 450mm
wafer and equipment development environment at SUNY Poly’s NanoTech Complex.
Toshikazu Umatate, Nikon Corporation Senior Vice President and General
Manager of the Semiconductor Lithography Business Unit said, “The
Nikon 450mm program is progressing steadily and this exciting milestone
was made possible by close collaboration with our many partners throughout
the consortium. Nikon is committed to continuous lithography innovation
and advancement, and supporting the industry in achieving the next generation
of semiconductor manufacturing.”
Dr. Alain E. Kaloyeros, SUNY Polytechnic Institute President and CEO said,
“The delivery of the Nikon Immersion Scanner is a victory in innovation
for New York State and another major milestone in Governor Cuomo’s
technology roadmap leading the global semiconductor industry to next generation
computer chip development. New York State remains at the cutting edge
of innovation, leveraging the expertise and resources of world class partners
like Nikon as we define the future of computer chip technology while driving
economic development and job creation.”
In July of 2013, Governor Cuomo announced a $350 million partnership between
SUNY Polytechnic's College of Nanoscale Science and Engineering and
Nikon to develop next generation 450mm photolithography technology. Photolithography
has become the critical enabling step in the manufacturing of nanometer
size transistors that are the building blocks of today's computer
chips. Nikon and SUNY Poly worked tirelessly to bring the immersion lithography
scanner online in less than 12 months and unveiled the world’s first
fully patterned 450mm wafers in July of 2014. The Nikon immersion tool
now joins existing 450mm infrastructure at SUNY Poly's College of
Nanoscale Science and Engineering, bringing the total investment in 450mm
wafer equipment at the Albany NanoTech Complex to more than $700 million.
About Nikon
Since 1980, Nikon Corporation has been revolutionizing lithography with
innovative products and technologies. The company is a worldwide leader
in semiconductor lithography systems for the microelectronics manufacturing
industry with more than 8,000 (semiconductor) lithography systems installed
worldwide. Nikon offers an extensive selection of production-class lithography
systems serving the semiconductor, flat panel display (FPD) and thin-film
magnetic head (TFH) industries. Nikon Precision Inc. provides service,
training, applications and technical support, as well as sales and marketing
for Nikon lithography systems in North America. For more information about
Nikon, visit
http://www.nikon.com.